Webinar | State-of-the-Practice for Vertical Barriers for Control of Contaminant Transport in the Subsurface
February 8 @ 12:30 pm - 1:30 pm EST
Join us on February 8, 2023 for the next part in our technical webinar series, State-of-the-Practice for Vertical Barriers for Control of Contaminant Transport in the Subsurface.
Slurry trench cutoff walls for dewatering became common in the 1970s and have since found widespread usage as a component of remediation of sites with contaminated groundwater. Thousands of cutoff walls have been deployed, and there have been significant developments in both our understanding of barrier wall technologies and the means and methods by which vertical barriers can be installed.
In this presentation, methods for installing vertical barriers for subsurface contaminant transport control are examined, including the use of trenchers and auger mixers. Developments in our understanding of the state of stress and the impact upon the hydraulic conductivity of the barrier are discussed. Finally, we will examine the improved understanding between the subsurface contaminants and the barrier wall mixtures.
This presentation will summarize the state-of-the-practice for the design and installation of vertical barriers for the control of contaminant transport in the subsurface. The understanding of mix designs and their performance will be presented including the widespread use of granulated ground blast furnace slag in self-hardening slurries used both in slurry trenching and in situ mixing.
Jeffrey Evans, PhD
Jeffrey Evans is Professor Emeritus at Bucknell University and a Principal Technical Consultant at Parsons.
He has 50 years of experience in geotechnical engineering with special expertise in environmental geotechnics and ground improvement.
To Join The Webinar
Join on your computer or mobile app.
Or call in (audio only) +1.951.465.7634 Phone Conference ID: 302 834 433#
Please visit the Parsons YouTube channel where video recordings of our previous technical webinars are available for viewing.